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Ruthenium etching solution "REC Series"

Etching solution for ruthenium used as a material for semiconductor devices and photomasks.

This is an etching solution suitable for Ru films used in DRAM capacitor electrodes and photomasks. 【Features】 ■ REC-01 can etch Ru films in a short time and is capable of etching RuO2 as well. ■ REC-11 can suppress the generation of RuO4 gas, resulting in less metal contamination on wafers. ■ REC-11 is suitable for etching Ru thin films several nm thick. *For more details, please feel free to contact us.